Molecular dynamics simulations of the crystal-melt interfacial free energy and mobility in Mo and V

  • J. J. Hoyt*
  • , M. Asta
  • , D. Y. Sun
  • *Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

52 Scopus citations

Abstract

Molecular dynamics simulations, based on embedded-atom method potentials, have been used to compute thermodynamic and kinetic properties of crystal-melt interfaces in the bcc metals Mo and V. The interfacial free energy and its associated crystalline anisotropy have been obtained with the capillary fluctuation method and for both metals the anisotropy and the value of the Turnbull coefficient are found to be significantly lower than for the case of fcc materials. The interface mobility, or kinetic coefficient, which relates the isothermal crystallization rate to interface undercooling, was computed by non-equilibrium molecular dynamics simulations. Mobilities in the range 9-16 cm s -1 K -1 are obtained. For Mo the mobility in the (110) crystallographic growth direction is larger than in the (100) and (111) directions, whereas for V the growth is found to be isotropic within numerical uncertainty. The kinetic-coefficient results are discussed within the framework of a density-functional-based theory of crystal growth.

Original languageEnglish
Pages (from-to)3651-3664
Number of pages14
JournalPhilosophical Magazine
Volume86
Issue number24
DOIs
StatePublished - 21 Aug 2006

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