Modeling and simulation for NBTI-considered path delay prediction in logical circuit

  • Yao Lin
  • , Xiaojin Li*
  • , Yanling Shi
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

NBTI (Negative Bias Temperature Instability) is a major concern in long-time circuit performance. In this paper, NBTI degradation models of basic logic gates have been developed based on the conventional reaction-diffusion (R-D) model which is used to predict the threshold voltage shift (ΔV TH) of p-type MOSFET. Besides load capacitance (CL), input slew rate (ti) and supply voltage (VDD), ΔV TH versus gate delay degradation of NAND, INV, and NOR have been evaluated and approximated by second-order polynomials. Furthermore, a method to calculate the degradation of circuit speed over a long period of time given input switching rate, duty factor and power supply, is built up. Finally, the effectiveness of the proposed has been demonstrated with the ISCAS'85 benchmark circuit.

Original languageEnglish
Title of host publication2014 International Workshop on Junction Technology, IWJT 2014
PublisherIEEE Computer Society
Pages69-72
Number of pages4
ISBN (Print)9781479936274
DOIs
StatePublished - 2014
Event14th International Workshop on Junction Technology, IWJT 2014 - Shanghai, China
Duration: 18 May 201420 May 2014

Publication series

Name2014 International Workshop on Junction Technology, IWJT 2014

Conference

Conference14th International Workshop on Junction Technology, IWJT 2014
Country/TerritoryChina
CityShanghai
Period18/05/1420/05/14

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