Microstructure and physical properties of SrBi2Ta2O9 ferroelectric thin films

  • Ping Xiong Yang*
  • , Hong Mei Deng
  • , Li Rong Zheng
  • , Cheng Lu Lin
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

High quality SrBi2Ta2O9 thin films on Pt/Ti/SiO2/Si substrates were obtained using pulsed laser deposition combined with annealing at 700°C in oxygen. The high diffraction peak of(008) and (115) was characterized by X-ray diffractometer. Good ferroelectric properties were obtained from the thin films; the remnant polarization and coercive field were about 10 μC/cm2 and 57 kV/cm, respectively. No fatigue was observed at up to 1010 switching cycles. Leakage current and the dc breakdown field measurement were about 4 × 10-8 A/cm2 at 5 V and 250 kV/cm, respectively.

Original languageEnglish
Pages (from-to)1455-1456
Number of pages2
JournalWuli Xuebao/Acta Physica Sinica
Volume46
Issue number7
StatePublished - 1997
Externally publishedYes

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