Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor

Jian Zhang; Al Palaniappan; Xiaodi Su; Francis E.H. Tay

doi:10.1117/12.607331

Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor

Jian Zhang^*
, Al Palaniappan
, Xiaodi Su
, Francis E.H. Tay

^*Corresponding author for this work

School of Communication and Electronic Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.

Original language	English
Article number	67
Pages (from-to)	291-295
Number of pages	5
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5774
DOIs	https://doi.org/10.1117/12.607331
State	Published - 2005
Event	Fifth International Conference on Thin Film Physics and Applications - Shanghai, China Duration: 31 May 2004 → 2 Jun 2004

Keywords

Argon plasma
Mesoporous
PEG template
Silica
Sol-gel

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10.1117/12.607331

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title = "Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor",

abstract = "Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.",

keywords = "Argon plasma, Mesoporous, PEG template, Silica, Sol-gel",

author = "Jian Zhang and Al Palaniappan and Xiaodi Su and Tay, \{Francis E.H.\}",

year = "2005",

doi = "10.1117/12.607331",

language = "英语",

volume = "5774",

pages = "291--295",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

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publisher = "SPIE",

note = "Fifth International Conference on Thin Film Physics and Applications ; Conference date: 31-05-2004 Through 02-06-2004",

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TY - JOUR

T1 - Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor

AU - Zhang, Jian

AU - Palaniappan, Al

AU - Su, Xiaodi

AU - Tay, Francis E.H.

PY - 2005

Y1 - 2005

N2 - Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.

AB - Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.

KW - Argon plasma

KW - Mesoporous

KW - PEG template

KW - Silica

KW - Sol-gel

UR - https://www.scopus.com/pages/publications/25644446214

U2 - 10.1117/12.607331

DO - 10.1117/12.607331

M3 - 会议文章

AN - SCOPUS:25644446214

SN - 0277-786X

VL - 5774

SP - 291

EP - 295

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 67

T2 - Fifth International Conference on Thin Film Physics and Applications

Y2 - 31 May 2004 through 2 June 2004

ER -

Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor

Abstract

Keywords

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