Abstract
Graphene chemical vapor deposition (CVD) growth is the most studied method for graphene synthesis. It has the advantages of synthesizing very large area graphene, easy to controlling the number of layers and easy for transfer from the catalyst surface to the desired substrates. But the quality of graphene CVD samples is still not as good as those made by the mechanical peeling method. So, improving the quality of CVD synthesized graphene is the primary objective of study. To achieve this requires careful experimental design with the guidance of detailed and insightful mechanism of growth. Although a great number of experimental and theoretical efforts have been dedicated to the understanding of graphene CVD growth, our knowledge is far from sufficient to guide the experimental design. So, here we plan to briefly present the recent status of graphene CVD growth, especially the theoretical understanding on the mechanism in this chapter.
| Original language | English |
|---|---|
| Title of host publication | Graphene Chemistry |
| Subtitle of host publication | Theoretical Perspectives |
| Publisher | wiley |
| Pages | 255-290 |
| Number of pages | 36 |
| ISBN (Electronic) | 9781118691281 |
| ISBN (Print) | 9781119942122 |
| DOIs | |
| State | Published - 9 Aug 2013 |
| Externally published | Yes |
Keywords
- Chemical vapor deposition
- Density functional theory
- Graphene
- Kinetics
- Nucleation and growth
- Two dimensional crystals