Mechanisms in fs-laser ablation in fused silica

  • T. Q. Jia*
  • , Z. Z. Xu
  • , R. X. Li
  • , D. H. Feng
  • , X. X. Li
  • , C. F. Cheng
  • , H. Y. Sun
  • , N. S. Xu
  • , H. Z. Wang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

51 Scopus citations

Abstract

The microscopic processes involved in the ablation on fused silica induced by femto second laser pulses were studied. The ability of conduction band electron (CBE) to absorb lase energy was demonstrated, the rate of which was calculated by quantum mechanical method and classical methods. CBE was produced by photoionization (PI) and impact ionization (II) and the rates were calculated using the Keldysh theory and double flux model. Taking energy density E dep-54kJ/cm3 as the criterion, the damage threshold ablation depth and ablation volumes were also calculated.

Original languageEnglish
Pages (from-to)5166-5171
Number of pages6
JournalJournal of Applied Physics
Volume95
Issue number9
DOIs
StatePublished - 1 May 2004
Externally publishedYes

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