Skip to main navigation Skip to search Skip to main content

Measurement of electron affinity in boron-doped diamond from capacitance spectroscopy

  • Kun Liu*
  • , Bo Zhang
  • , Mingfang Wan
  • , J. H. Chu
  • , C. Johnston
  • , S. Roth
  • *Corresponding author for this work
  • CAS - Shanghai Institute of Technical Physics
  • Ricardo
  • Max Planck Institute for Solid State Research

Research output: Contribution to journalArticlepeer-review

Abstract

Boron-doped diamond film sample has been grown on (100) silicon substrate using the microwave enhanced chemical vapor deposition method. It is found that the sample has very good material qualities and an excellent (100) surface morphology. Au/diamond Schottky was fabricated on the (100) surface to study electron affinity of the diamond sample. By measuring frequency dependence capacitance-voltage spectroscopy of the Schottky sample in high vacuum and at room temperature, a very small electron affinity of about 0.025 eV and a work function of about 5.165 eV have been obtained for the (100) surface of the diamond sample supposing the diamond band gap energy is 5.5 eV.

Original languageEnglish
Pages (from-to)2891-2893
Number of pages3
JournalApplied Physics Letters
Volume70
Issue number21
DOIs
StatePublished - 26 May 1997
Externally publishedYes

Fingerprint

Dive into the research topics of 'Measurement of electron affinity in boron-doped diamond from capacitance spectroscopy'. Together they form a unique fingerprint.

Cite this