TY - JOUR
T1 - Manipulating the Ferroelectric Domain States and Structural Distortion in Epitaxial BiFeO 3 Ultrathin Films via Bi Nonstoichiometry
AU - Tian, Shilu
AU - Wang, Can
AU - Zhou, Yong
AU - Li, Xiaomei
AU - Gao, Peng
AU - Wang, Jiesu
AU - Feng, Yu
AU - Yao, Xiaokang
AU - Ge, Chen
AU - He, Meng
AU - Bai, Xuedong
AU - Yang, Guozhen
AU - Jin, Kuijuan
N1 - Publisher Copyright:
Copyright © 2018 American Chemical Society.
PY - 2018/12/19
Y1 - 2018/12/19
N2 - Exploring and manipulating domain configurations in ferroelectric thin films are of critical importance for the design and fabrication of ferroelectric heterostructures with a novel functional performance. In this study, BiFeO 3 (BFO) ultrathin films with various Bi/Fe ratios from excess Bi to deficient Bi have been grown on (La 0.7 Sr 0.3 )MnO 3 (LSMO)-covered SrTiO 3 substrates by a laser molecular beam epitaxy system. Atomic force microscopy and piezoresponse force microscopy measurements show that both the surface morphology and ferroelectric polarization of the films are relevant to Bi nonstoichiometry. More significantly, a Bi-excess thin film shows an upward (from substrate to film surface) uniform ferroelectric polarization, whereas a Bi-deficient thin film exhibits a downward uniform polarization, which means the as-grown polarization of BFO thin films can be controlled by changing the Bi contents. Atomic-scale structural and chemical characterizations and second-harmonic generation measurements reveal that two different kinds of structural distortions and interface atomic configurations in the BFO/LSMO heterostructures can be induced by the change of Bi nonstoichiometry, leading to the two opposite as-grown ferroelectric polarizations. It has also been revealed that the band gap of BFO thin films can be modulated via Bi nonstoichiometry. These results demonstrate that Bi nonstoichiometry plays a key role on the ferroelectric domain states and physical properties of BFO thin films and also open a new avenue to manipulate the structure and ferroelectric domain states in BFO thin films.
AB - Exploring and manipulating domain configurations in ferroelectric thin films are of critical importance for the design and fabrication of ferroelectric heterostructures with a novel functional performance. In this study, BiFeO 3 (BFO) ultrathin films with various Bi/Fe ratios from excess Bi to deficient Bi have been grown on (La 0.7 Sr 0.3 )MnO 3 (LSMO)-covered SrTiO 3 substrates by a laser molecular beam epitaxy system. Atomic force microscopy and piezoresponse force microscopy measurements show that both the surface morphology and ferroelectric polarization of the films are relevant to Bi nonstoichiometry. More significantly, a Bi-excess thin film shows an upward (from substrate to film surface) uniform ferroelectric polarization, whereas a Bi-deficient thin film exhibits a downward uniform polarization, which means the as-grown polarization of BFO thin films can be controlled by changing the Bi contents. Atomic-scale structural and chemical characterizations and second-harmonic generation measurements reveal that two different kinds of structural distortions and interface atomic configurations in the BFO/LSMO heterostructures can be induced by the change of Bi nonstoichiometry, leading to the two opposite as-grown ferroelectric polarizations. It has also been revealed that the band gap of BFO thin films can be modulated via Bi nonstoichiometry. These results demonstrate that Bi nonstoichiometry plays a key role on the ferroelectric domain states and physical properties of BFO thin films and also open a new avenue to manipulate the structure and ferroelectric domain states in BFO thin films.
KW - Bi nonstoichiometry
KW - BiFeO ultrathin films
KW - ferroelectric domain states
KW - interface atomic configuration
KW - structural distortion
UR - https://www.scopus.com/pages/publications/85058821788
U2 - 10.1021/acsami.8b15703
DO - 10.1021/acsami.8b15703
M3 - 文章
C2 - 30474948
AN - SCOPUS:85058821788
SN - 1944-8244
VL - 10
SP - 43792
EP - 43801
JO - ACS Applied Materials and Interfaces
JF - ACS Applied Materials and Interfaces
IS - 50
ER -