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Magnetism induced by boron impurities in amorphous silicon

  • Y. Zhu*
  • , C. L. Du
  • , D. N. Shi
  • , K. C. Zhang
  • , C. L. Ma
  • , S. J. Gong
  • , Z. Q. Yang
  • *Corresponding author for this work
  • Nanjing University of Aeronautics and Astronautics
  • Bohai University
  • Suzhou University of Science and Technology
  • Fudan University

Research output: Contribution to journalArticlepeer-review

Abstract

With first-principles calculations, magnetism is found in amorphous silicon doped with B impurities. The maximum magnetic moment per impurity atom is predicted to be ∼1.0 B which originates mostly from unsaturated bond around three-fold coordinated Si atoms. Stoner criterion is employed to account for the magnetism induced by p-type impurities. The obtained spin polarized energies are around 50 meV, indicating that the magnetism found in amorphous silicon is able to survive even at room temperature.

Original languageEnglish
Article number073913
JournalJournal of Applied Physics
Volume109
Issue number7
DOIs
StatePublished - 1 Apr 2011

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