TY - JOUR
T1 - Magnetic anisotropy of NiFeP/Cu composite wire induced by chemical plating under DC current
AU - Sun, Xutao
AU - Xie, Lei
AU - Li, Xin
AU - Liu, Jiang
AU - Xie, Wenhui
AU - Zhao, Zhenjie
N1 - Publisher Copyright:
© 2024 Elsevier B.V.
PY - 2024/8/1
Y1 - 2024/8/1
N2 - NiFeP/Cu composite wires were fabricated by chemical plating under DC current. In this work, DC current was adjusted from 0 to 100 mA and the influence of current on the surface morphology, magnetic properties and GMI effect was investigated. It is found that the DC current has little impact on the composition of the coating. However, with the change of current, the surface morphology, plating rate and magnetic properties of the coating have undergone significant changes which in turn affect the GMI effect. As a result, when the appropriate current is applied, a transverse magnetic structure with an anisotropy angle of approximately 26 degrees can be generated, enabling a maximum GMI ratio of 1964 % and a field sensitivity of 463 %/Oe, which shows potential practical application in the magnetic sensors.
AB - NiFeP/Cu composite wires were fabricated by chemical plating under DC current. In this work, DC current was adjusted from 0 to 100 mA and the influence of current on the surface morphology, magnetic properties and GMI effect was investigated. It is found that the DC current has little impact on the composition of the coating. However, with the change of current, the surface morphology, plating rate and magnetic properties of the coating have undergone significant changes which in turn affect the GMI effect. As a result, when the appropriate current is applied, a transverse magnetic structure with an anisotropy angle of approximately 26 degrees can be generated, enabling a maximum GMI ratio of 1964 % and a field sensitivity of 463 %/Oe, which shows potential practical application in the magnetic sensors.
KW - Chemical plating
KW - Giant Magnetoimpedance effect
KW - Magnetic anisotropy
KW - Magnetic microwires
UR - https://www.scopus.com/pages/publications/85196178550
U2 - 10.1016/j.jmmm.2024.172269
DO - 10.1016/j.jmmm.2024.172269
M3 - 文章
AN - SCOPUS:85196178550
SN - 0304-8853
VL - 603
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
M1 - 172269
ER -