Low-temperature formation of nanocrystalline β-SiC with high surface area and mesoporosity via reaction of mesoporous carbon and silicon powder

  • Zhicheng Liu
  • , Weihua Shen
  • , Wenbo Bu
  • , Hangrong Chen
  • , Zile Hua
  • , Lingxia Zhang
  • , Lei Li
  • , Jianlin Shi*
  • , Shouhong Tan
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

85 Scopus citations

Abstract

We report here a new route to prepare nanocrystalline β-silicon carbide with high specific surface areas and mesoporosity. The preparation method was via the reaction of ordered mesoporous carbons (OMCs, carbon replicas of MCM-48, SBA-15 and KIT-6) with silicon powder at the temperature of 1200-1300 °C, which is below the melting point of silicon, 1420 °C. The SiC samples were characterized by XRD, SEM, TEM, N2 adsorption and other techniques, which showed that the SiC samples were nanocrystalline and had a high surface area of up to 147 m2 g-1 and a mesoporosity in the range of 5-40 nm. In addition, the silicon vapor infiltration method at a temperature beyond 1420 °C was also brought into comparison.

Original languageEnglish
Pages (from-to)137-145
Number of pages9
JournalMicroporous and Mesoporous Materials
Volume82
Issue number1-2
DOIs
StatePublished - 5 Jul 2005
Externally publishedYes

Keywords

  • Low-temperature formation
  • Mesoporosity
  • Mesoporous carbon
  • Nanocrystalline
  • Si powder
  • β-SiC

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