Long wavelength infrared metalens fabricated by photolithography

Yun Peng Li; Jia Cheng Luo; Ruo Nan Ji; Mao Bin Xie; Wen Nan Cui; Shao Wei Wang; Feng Liu; Wei Lu

doi:10.11972/j.issn.1001-9014.2024.05.003

Long wavelength infrared metalens fabricated by photolithography

Yun Peng Li
, Jia Cheng Luo
, Ruo Nan Ji
, Mao Bin Xie
, Wen Nan Cui
, Shao Wei Wang
, Feng Liu^*
, Wei Lu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

Metasurfaces in the long wave infrared（LWIR）spectrum hold great potential for applications in thermal imaging，atmospheric remote sensing，and target identification，among others. In this study，we designed and experimentally demonstrated a 4 mm size，all-silicon metasurface metalens with large depth of focus operational across a broadband range from 9 μm to 11. 5 μm. The experimental results confirm effective focusing and imaging capabilities of the metalens in LWIR region，thus paving the way for practical LWIR applications of metalens technology.

Translated title of the contribution	光刻法制备的长波红外超透镜
Original language	English
Pages (from-to)	603-608
Number of pages	6
Journal	Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves
Volume	43
Issue number	5
DOIs	https://doi.org/10.11972/j.issn.1001-9014.2024.05.003
State	Published - Oct 2024
Externally published	Yes

Keywords

broadband operation
long wave infrared
passive imaging

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10.11972/j.issn.1001-9014.2024.05.003

Cite this

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title = "Long wavelength infrared metalens fabricated by photolithography",

abstract = "Metasurfaces in the long wave infrared（LWIR）spectrum hold great potential for applications in thermal imaging，atmospheric remote sensing，and target identification，among others. In this study，we designed and experimentally demonstrated a 4 mm size，all-silicon metasurface metalens with large depth of focus operational across a broadband range from 9 μm to 11. 5 μm. The experimental results confirm effective focusing and imaging capabilities of the metalens in LWIR region，thus paving the way for practical LWIR applications of metalens technology.",

keywords = "broadband operation, long wave infrared, passive imaging",

author = "Li, \{Yun Peng\} and Luo, \{Jia Cheng\} and Ji, \{Ruo Nan\} and Xie, \{Mao Bin\} and Cui, \{Wen Nan\} and Wang, \{Shao Wei\} and Feng Liu and Wei Lu",

year = "2024",

month = oct,

doi = "10.11972/j.issn.1001-9014.2024.05.003",

language = "英语",

volume = "43",

pages = "603--608",

journal = "Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves",

issn = "1001-9014",

publisher = "Chinese Optical Society",

number = "5",

}

TY - JOUR

T1 - Long wavelength infrared metalens fabricated by photolithography

AU - Li, Yun Peng

AU - Luo, Jia Cheng

AU - Ji, Ruo Nan

AU - Xie, Mao Bin

AU - Cui, Wen Nan

AU - Wang, Shao Wei

AU - Liu, Feng

AU - Lu, Wei

PY - 2024/10

Y1 - 2024/10

N2 - Metasurfaces in the long wave infrared（LWIR）spectrum hold great potential for applications in thermal imaging，atmospheric remote sensing，and target identification，among others. In this study，we designed and experimentally demonstrated a 4 mm size，all-silicon metasurface metalens with large depth of focus operational across a broadband range from 9 μm to 11. 5 μm. The experimental results confirm effective focusing and imaging capabilities of the metalens in LWIR region，thus paving the way for practical LWIR applications of metalens technology.

AB - Metasurfaces in the long wave infrared（LWIR）spectrum hold great potential for applications in thermal imaging，atmospheric remote sensing，and target identification，among others. In this study，we designed and experimentally demonstrated a 4 mm size，all-silicon metasurface metalens with large depth of focus operational across a broadband range from 9 μm to 11. 5 μm. The experimental results confirm effective focusing and imaging capabilities of the metalens in LWIR region，thus paving the way for practical LWIR applications of metalens technology.

KW - broadband operation

KW - long wave infrared

KW - passive imaging

UR - https://www.scopus.com/pages/publications/85204934294

U2 - 10.11972/j.issn.1001-9014.2024.05.003

DO - 10.11972/j.issn.1001-9014.2024.05.003

M3 - 文章

AN - SCOPUS:85204934294

SN - 1001-9014

VL - 43

SP - 603

EP - 608

JO - Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves

JF - Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves

IS - 5

ER -

Long wavelength infrared metalens fabricated by photolithography

Abstract

Keywords

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