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Local leakage current behaviours of BiFeO3 films

  • Cheng Zou
  • , Bin Chen*
  • , Xiao Jian Zhu
  • , Zheng Hu Zuo
  • , Yi Wei Liu
  • , Yuan Fu Chen
  • , Qing Feng Zhan
  • , Run Wei Li
  • *Corresponding author for this work
  • University of Electronic Science and Technology of China
  • CAS - Ningbo Institute of Material Technology and Engineering

Research output: Contribution to journalArticlepeer-review

Abstract

The leakage current behaviours of polycrystalline BiFeO3 thin films are investigated by using both conductive atomic force microscopy and current-voltage characteristic measurements. The local charge transport pathways are found to be located mainly at the grain boundaries of the films. The leakage current density can be tuned by changing the post-annealing temperature, the annealing time, the bias voltage and the light illumination, which can be used to improve the performances of the ferroelectric devices based on the BiFeO3 films. A possible leakage mechanism is proposed to interpret the charge transports in the polycrystalline BiFeO3 films.

Original languageEnglish
Article number117701
JournalChinese Physics B
Volume20
Issue number11
DOIs
StatePublished - Nov 2011
Externally publishedYes

Keywords

  • conductive atomic force microscopy
  • local leakage current
  • polycrystalline BiFeO thin films

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