LithoMamba: High-fidelity lithography simulation with State Space Models

Lithography simulation is a critical technology in modern semiconductor manufacturing, yet existing deep learning models often fail to accurately model the complex, long-range optical physics due to the inherent locality of convolution. This limitation results in insufficient simulation fidelity and poses significant challenges for optimization tasks. To overcome this challenge, we introduce LithoMamba, the first generative framework to leverage Mamba for high-fidelity lithography simulation. Our architecture uses a Mamba Generator to model global and long-range optical interactions, while a local, MLP-free Discriminator provides precise, spatial feedback to ensure fine-grained pattern fidelity. This global-local design enables our model to achieve both physical realism and exceptional detail. Our experiments show that LithoMamba outperforms existing methods, both in quantitative and qualitative results. These findings demonstrate the promise of State Space Models for improving lithography simulation and suggest new possibilities for combining physics with generative AI in chip manufacturing.