Lithium Niobate Photonic Integrated Circuits

Ya Cheng

doi:10.1109/SiPhotonics68911.2026.11520736

Lithium Niobate Photonic Integrated Circuits

Ya Cheng^*

^*Corresponding author for this work

School of Physics and Electronic Science

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this work, we introduce photolithographyassisted chemo-mechanical etching (PLACE) as a novel approach for scalable fabrication of high-quality thin film lithium niobate (TFLN) photonic circuits. We demonstrate a range of integrated components and systems, including ultralow-loss delay lines, integrated photonic neural networks, electro-optically tunable lasers, and high-gain waveguide amplifiers. These devices exhibit state-of-the-art performance across key metrics such as modulation bandwidth, power efficiency, insertion loss, and functional versatility.

Original language	English
Title of host publication	2026 IEEE Silicon Photonics Conference, SiPhotonics 2026 - Proceedings
Publisher	IEEE Computer Society
ISBN (Electronic)	9798331570217
DOIs	https://doi.org/10.1109/SiPhotonics68911.2026.11520736
State	Published - 2026
Event	2026 IEEE Silicon Photonics Conference, SiPhotonics 2026 - Ottawa, Canada Duration: 13 Apr 2026 → 15 Apr 2026

Publication series

Name	IEEE International Conference on Group IV Photonics GFP
Volume	2026-April
ISSN (Print)	1949-2081
ISSN (Electronic)	1949-209X

Conference

Conference	2026 IEEE Silicon Photonics Conference, SiPhotonics 2026
Country/Territory	Canada
City	Ottawa
Period	13/04/26 → 15/04/26

Keywords

photolithography
photonic integrated circuits
thin film lithium niobate

Access to Document

10.1109/SiPhotonics68911.2026.11520736

Cite this

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title = "Lithium Niobate Photonic Integrated Circuits",

abstract = "In this work, we introduce photolithographyassisted chemo-mechanical etching (PLACE) as a novel approach for scalable fabrication of high-quality thin film lithium niobate (TFLN) photonic circuits. We demonstrate a range of integrated components and systems, including ultralow-loss delay lines, integrated photonic neural networks, electro-optically tunable lasers, and high-gain waveguide amplifiers. These devices exhibit state-of-the-art performance across key metrics such as modulation bandwidth, power efficiency, insertion loss, and functional versatility.",

keywords = "photolithography, photonic integrated circuits, thin film lithium niobate",

author = "Ya Cheng",

note = "Publisher Copyright: {\textcopyright} 2026 IEEE.; 2026 IEEE Silicon Photonics Conference, SiPhotonics 2026 ; Conference date: 13-04-2026 Through 15-04-2026",

year = "2026",

doi = "10.1109/SiPhotonics68911.2026.11520736",

language = "英语",

series = "IEEE International Conference on Group IV Photonics GFP",

publisher = "IEEE Computer Society",

booktitle = "2026 IEEE Silicon Photonics Conference, SiPhotonics 2026 - Proceedings",

address = "美国",

}

Cheng, Y 2026, Lithium Niobate Photonic Integrated Circuits. in 2026 IEEE Silicon Photonics Conference, SiPhotonics 2026 - Proceedings. IEEE International Conference on Group IV Photonics GFP, vol. 2026-April, IEEE Computer Society, 2026 IEEE Silicon Photonics Conference, SiPhotonics 2026, Ottawa, Canada, 13/04/26. https://doi.org/10.1109/SiPhotonics68911.2026.11520736

TY - GEN

T1 - Lithium Niobate Photonic Integrated Circuits

AU - Cheng, Ya

PY - 2026

Y1 - 2026

N2 - In this work, we introduce photolithographyassisted chemo-mechanical etching (PLACE) as a novel approach for scalable fabrication of high-quality thin film lithium niobate (TFLN) photonic circuits. We demonstrate a range of integrated components and systems, including ultralow-loss delay lines, integrated photonic neural networks, electro-optically tunable lasers, and high-gain waveguide amplifiers. These devices exhibit state-of-the-art performance across key metrics such as modulation bandwidth, power efficiency, insertion loss, and functional versatility.

AB - In this work, we introduce photolithographyassisted chemo-mechanical etching (PLACE) as a novel approach for scalable fabrication of high-quality thin film lithium niobate (TFLN) photonic circuits. We demonstrate a range of integrated components and systems, including ultralow-loss delay lines, integrated photonic neural networks, electro-optically tunable lasers, and high-gain waveguide amplifiers. These devices exhibit state-of-the-art performance across key metrics such as modulation bandwidth, power efficiency, insertion loss, and functional versatility.

KW - photolithography

KW - photonic integrated circuits

KW - thin film lithium niobate

UR - https://www.scopus.com/pages/publications/105040953962

U2 - 10.1109/SiPhotonics68911.2026.11520736

DO - 10.1109/SiPhotonics68911.2026.11520736

M3 - 会议稿件

AN - SCOPUS:105040953962

T3 - IEEE International Conference on Group IV Photonics GFP

BT - 2026 IEEE Silicon Photonics Conference, SiPhotonics 2026 - Proceedings

PB - IEEE Computer Society

T2 - 2026 IEEE Silicon Photonics Conference, SiPhotonics 2026

Y2 - 13 April 2026 through 15 April 2026

ER -

Lithium Niobate Photonic Integrated Circuits

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