TY - JOUR
T1 - Kinetics of holographic recording and spontaneous erasure processes in light-sensitive liquid crystal elastomers
AU - Gregorc, Marko
AU - Li, Hui
AU - Domenici, Valentina
AU - Ambrožič, Gabriela
AU - Čopič, Martin
AU - Drevenšek-Olenik, Irena
PY - 2012
Y1 - 2012
N2 - The optical mechanism for imprinting one-dimensional grating structures into thin films of a light-sensitive monodomain liquid crystal elastomer is investigated by analyzing the time dependence of optical diffraction properties. The recording kinetics shows an irregular oscillatory behavior, which is most expressed at small grating spacings and at temperatures close to the nematic-isotropic phase transition. The oscillations are attributed to the opto-mechanical response of the film, i.e., to contraction of the film during the recording process. At temperatures far below the nematic-isotropic phase transition, the spontaneous erasure kinetics exhibits exponential relaxation with relaxation time following the Arrhenius activation law. However, at temperatures close to the nematic-isotropic phase transition, the erasure process shows an interesting nonmonotonic behavior that weattribute to the non-linear relation between the concentration of the photo-transformed chemical groups and the nematic order parameter.
AB - The optical mechanism for imprinting one-dimensional grating structures into thin films of a light-sensitive monodomain liquid crystal elastomer is investigated by analyzing the time dependence of optical diffraction properties. The recording kinetics shows an irregular oscillatory behavior, which is most expressed at small grating spacings and at temperatures close to the nematic-isotropic phase transition. The oscillations are attributed to the opto-mechanical response of the film, i.e., to contraction of the film during the recording process. At temperatures far below the nematic-isotropic phase transition, the spontaneous erasure kinetics exhibits exponential relaxation with relaxation time following the Arrhenius activation law. However, at temperatures close to the nematic-isotropic phase transition, the erasure process shows an interesting nonmonotonic behavior that weattribute to the non-linear relation between the concentration of the photo-transformed chemical groups and the nematic order parameter.
KW - Holographic lithography
KW - Light-sensitive materials
KW - Liquid crystal elastomers
KW - Optical microstructuring
KW - Recording kinetics
UR - https://www.scopus.com/pages/publications/85031049408
U2 - 10.3390/ma5050741
DO - 10.3390/ma5050741
M3 - 文章
AN - SCOPUS:85031049408
SN - 1996-1944
VL - 5
SP - 741
EP - 753
JO - Materials
JF - Materials
IS - 5
ER -