Investigation of photoreaction mechanism of photosensitive glass by femtosecond laser

  • Tomohiro Hongo*
  • , Koji Sugioka
  • , Hiroyuki Niino
  • , Ya Cheng
  • , Masashi Masuda
  • , Iwao Miyamoto
  • , Hiroshi Takai
  • , Katsumi Midorikawa
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

95 Scopus citations

Abstract

A high-intensity femtosecond (fs) laser can fabricate complicated three-dimensional microstructures inside photosensitive glass with high spatial resolution. In this work, the mechanism of the photoreaction of the photosensitive glass to the infrared fs laser is investigated. We examine the photoinduced electron excitation process on the basis of the determination of the critical dose and a change of the optical-absorption spectrum after the fs laser irradiation. The photoreaction mechanism is discussed in comparison with the case of an ultraviolet nanosecond laser irradiation. Finally, the successive interband electron excitation through defect levels by multiphoton absorption is proposed.

Original languageEnglish
Article number063517
JournalJournal of Applied Physics
Volume97
Issue number6
DOIs
StatePublished - 2005
Externally publishedYes

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