Investigation of Ni doped Ge-Te materials for high temperature phase change memory applications

  • Liang Liang Cao
  • , Liang Cai Wu*
  • , Zhi Tang Song
  • , Wen Qing Zhu
  • , Yong Hui Zheng
  • , Yan Cheng
  • , San Nian Song
  • , Zhong Yuan Ma
  • , Ling Xu
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Ni-doped Ge-Te (Ni-GT) material was proposed and investigated for phase change random access memory (PCRAM) applications. With Ni addition, the crystallization temperature, data retention ability and crystallization speed were obviously improved. The surface roughness of crystalline Ni-GT films was decreased by Ni incorporation. Moreover, temperature dependent transmission electron microscopy (TEM) was applied to investigate the phase change behavior of Ni-GT films. All the experimental results demonstrated that Ni-GT material has potential for high-speed PCRAM applications in high temperature environment.

Original languageEnglish
Title of host publicationFunctional and Functionally Structured Materials
EditorsYafang Han, Ying Wu, Guangxian Li, Fusheng Pan, Xuefeng Liu, Runhua Fan
PublisherTrans Tech Publications Ltd
Pages460-465
Number of pages6
ISBN (Print)9783038357605
DOIs
StatePublished - 2016
Externally publishedYes
EventChinese Materials Congress on Functional and Functionally Structured Materials, CMC 2015 - Guiyang, China
Duration: 10 Jul 201514 Jul 2015

Publication series

NameMaterials Science Forum
Volume848
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

ConferenceChinese Materials Congress on Functional and Functionally Structured Materials, CMC 2015
Country/TerritoryChina
CityGuiyang
Period10/07/1514/07/15

Keywords

  • Crystallization temperature
  • Phase change material
  • Surface roughness
  • Thermal stability

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