Influence of high-frequency discharged-aided magnetron sputtering deposition and argon pressure on structure and magnetic properties of Co/Cu multilayer film

The argon pressure during magnetron sputtering deposition can significantly affect the film morphology, especially for ultrathin multilayer film. With the aid of high-frequency discharge, the argon pressure can be reduced by one order of magnitude during sputtering. The Co/Cu multilayer film prepared at 0.3 Pa was proved to have well-defined sharp interface and good periodical multilayered structure by the low angle X-ray diffraction patterns and the existence of great magnetoresistance.