@inproceedings{bb37cb8b0d85423ca6e27a4531bee198,
title = "Indium tin oxide films prepared by radio frequency magnetron sputtering under low vacuum level",
abstract = "We have prepared indium tin oxide (ITO) thin films using radio frequency (RF) magnetron sputtering and under a quite low vacuum level of 2.3 × 10-3 Pa. The sputtering was done in an Ar and O2 gas mixture at a temperature of 200 °C. A ceramic ln2O3 : SnO2 target (10 wt\% SnO2) was used. The microstructures of the films were investigated by a field emission scanning electron microscope (FESEM) and an X-ray diffractometer (XRD). X-ray photoelectron spectroscopy (XPS) was performed to characterize the compositions of the films. ITO films with a high transparency in the visible wavelength range (80\% -95\% ) were obtained. At a low working pressure ( 1 Pa), the more highly transparent and conductive films were produced at the lower O2 flow ratio. At a high working pressure (2 Pa), low quality, low transparency and amorphous films were obtained.",
keywords = "Indium tin oxide, Radio frequency magnetron sputtering, Thin film, X-ray photoelectron spectroscopy",
author = "Li, \{X. D.\} and Zhu, \{H. B.\} and Chu, \{J. B.\} and Huang, \{S. Y.\} and Z. Sun and Chen, \{Y. W.\} and Huang, \{S. M.\}",
year = "2007",
language = "英语",
isbn = "9787561752289",
series = "AD'07 - Proceedings of Asia Display 2007",
pages = "1844--1848",
booktitle = "AD'07 - Proceedings of Asia Display 2007",
note = "Asia Display 2007, AD'07 ; Conference date: 12-03-2007 Through 16-03-2007",
}