@inproceedings{b5944f707bec4c55a182d75551611f8e,
title = "In-situ atomic visualization of structural transformation in Hf0.5Zr0.5O2 ferroelectric thin film: From nonpolar tetragonal phase to polar orthorhombic phase",
abstract = "For the first time, we directly visualized the dynamic process of phase transformation in polycrystalline ferroelectric (FE) Hf0.5Zr0.5O2 (HZO) thin film though in-situ spherical aberration (Cs)-corrected transmission electron microscopy (TEM) technique. The main observations are: (1) the dynamic atomic scale structural evolution from centrosymmetric tetragonal (t-) phase to FE orthorhombic (o-) phase under electric field, and (2) the deformation of atomic arrangements in lattice caused by stress is helpful to make the transition happen. These observations provide solid evidence on understanding the fundamental mechanism of the root cause of ferroelectricity in fluorite-type FE materials.",
keywords = "Ferroelectric, HZO film, In-situ TEM, Phase transition",
author = "Yunzhe Zheng and Chaorong Zhong and Yonghui Zheng and Zhaomeng Gao and Yan Cheng and Qilan Zhong and Cheng Liu and Yiwei Wang and Ruijuan Qi and Rong Huang and Hangbing Lyu",
note = "Publisher Copyright: {\textcopyright} 2021 JSAP; 41st Symposium on VLSI Technology, VLSI Technology 2021 ; Conference date: 13-06-2021 Through 19-06-2021",
year = "2021",
language = "英语",
series = "Digest of Technical Papers - Symposium on VLSI Technology",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2021 Symposium on VLSI Technology, VLSI Technology 2021",
address = "美国",
}