Improvement of the Emission Intensity of GaN-Based Micro-Light Emitting Diodes by a Suspended Structure

  • Yang Mei
  • , Minchao Xie
  • , Tao Yang
  • , Xin Hou
  • , Wei Ou
  • , Hao Long
  • , Leiying Ying
  • , Yuejun Liu
  • , Guoen Weng*
  • , Shaoqiang Chen
  • , Baoping Zhang*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Abstract

Herein, suspended GaN-based micro-light emitting diodes (LEDs) are ingeniously proposed and fabricated, showing a substantially enhanced light emission compared to conventional micro-LEDs on the sapphire substrate. The suspended architecture is prepared by transferring epitaxial layers to micrometal pillars on the copper plate after removing the original sapphire substrate. The photoluminescence intensity of the suspended micro-LED exhibits 150% higher than that of the normal device, and the electroluminescence intensity is increased by 114% in the current injection range of 0-10 mA. The enhancement of the output intensity benefits from the partially relaxed strain of the epitaxial film and the resultant reduction of the quantum confined Stark effect in the InGaN quantum well active region, as well as the improved light extraction efficiency due to the larger light-escaping area and less optical absorption and trapping, which are unambiguously verified by Raman spectroscopy and ray-tracing simulations. This study provides a new promising route to design and fabricate highly efficient micro-LEDs for practical applications.

Original languageEnglish
Pages (from-to)3967-3973
Number of pages7
JournalACS Photonics
Volume9
Issue number12
DOIs
StatePublished - 21 Dec 2022
Externally publishedYes

Keywords

  • GaN-based micro-LED
  • large light extraction efficiency
  • strain relaxation
  • suspended device mesa

Fingerprint

Dive into the research topics of 'Improvement of the Emission Intensity of GaN-Based Micro-Light Emitting Diodes by a Suspended Structure'. Together they form a unique fingerprint.

Cite this