Highly (h00) oriented growth of SrTiO3 thin films on Si(100) substrates by RF magnetron sputtering and their optical properties

  • J. H. Ma
  • , J. H. Pin
  • , Z. M. Huang
  • , Y. H. Gao
  • , T. Lin
  • , F. W. Shi
  • , J. L. Sun
  • , J. H. Chu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

SrTiO3 (STO) thin films were grown on Si(100) substrates by RF magnetron sputtering. The substrate temperature was found to be a crucial parameter to obtain the highly (h00) oriented growth. At the substrate temperature of 700 °C, STO thin films with the (h00)-orientation parameter (αh00) of more than 93% were realized. Using vitreous silica as the substrate, the optical properties of STO thin film prepared at 700 °C were investigated by transmittance measurements. The fitting method was used to calculate the refractive index and the film thickness from the transparent region of the transmittance spectra. The dispersion of the refractive index was studied by considering a single electronic oscillator model. According to Tauc's law, the band gap of the film was found to be about 3.62 eV.

Original languageEnglish
Title of host publicationSixth International Conference on Thin Film Physics and Applications
DOIs
StatePublished - 2008
Externally publishedYes
Event6th International Conference on Thin Film Physics and Applications, TFPA 2007 - Shanghai, China
Duration: 25 Sep 200728 Sep 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6984
ISSN (Print)0277-786X

Conference

Conference6th International Conference on Thin Film Physics and Applications, TFPA 2007
Country/TerritoryChina
CityShanghai
Period25/09/0728/09/07

Keywords

  • Optical properties
  • Oriented growth
  • RF magnetron sputtering
  • SrTiO thin films

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