Highly (222)-oriented pyrochlore PZN-PT thin films prepared by pulsed laser deposition

H. L. Han, A. Y. Liu*, L. L. Wei, P. Wang, F. T. Lin, W. Z. Shi, C. B. Jing

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Highly (222)-oriented 90%Pb(Zn1/3Nb2/3)O 3-10%PbTiO3(abbreviated PZN-PT) thin films, about 550nm in thickness, have been successfully grown on (111)Pt/Ti/SiO2/Si substrate by pulsed laser deposition method. Pure pyrochlore phase with highly (222)-preferred orientation, determined by X-ray diffraction, was formed in the PZN-PT thin films when the temperature of substrates is 550 °C. FE-SEM investigation shows that the surface appearance and the cross section of the films are smooth and crack-free with some dispersive spherical protrusions. The dielectric constant and loss of the thin films were measured using an impedance analyzer (HP4194A). The dielectric constant (εr) and the dissipation factor (tanδ) at 1 kHz are 205 and 0.03, respectively.

Original languageEnglish
Title of host publicationEighth International Conference on Thin Film Physics and Applications
DOIs
StatePublished - 2013
Event8th International Conference on Thin Film Physics and Applications, TFPA 2013 - Shanghai, China
Duration: 20 Sep 201323 Sep 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9068
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference8th International Conference on Thin Film Physics and Applications, TFPA 2013
Country/TerritoryChina
CityShanghai
Period20/09/1323/09/13

Keywords

  • Dielectric loss
  • PZN-PT thin films
  • Pulsed laser deposition
  • Pyrochlore

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