High-Q photonic flat-band resonances for enhancing third-harmonic generation in all-dielectric metasurfaces

Kaili Sun, Keren Wang, Wei Wang, Yangjian Cai, Lujun Huang, Andrea Alù, Zhanghua Han

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Nonlinear optical processes are crucial to many applications, such as telecommunications and medical imaging. Traditional materials, however, exhibit only weak optical nonlinearity. High-quality (Q) factor photonic resonances are a promising means of enhancing nonlinear optical processes. Nevertheless, despite significant progress in boosting high-harmonic generations by harnessing high-Q resonances, further improvement of the nonlinear conversion efficiency is sought. Here, we propose a means of achieving flat-band high-Q resonances in all-dielectric metasurfaces featuring distorted photonic lattices. We demonstrate this experimentally in silicon metasurfaces, showing stable high-Q (∼1,600) flat-band resonances that persist over incident angles between −12° and 12° while highlighting optimizations that would further extend the angular range. We then show that these resonances lead to a large enhancement of third-harmonic generation by a factor of nearly 104 times compared to silicon films of the same thickness. The introduced flat-band design unlocks new potential for a broad range of applications, including nonlinear imaging, photodetection, optical signal processing, and data storage, thereby laying the groundwork for the development of next-generation photonic devices.

Original languageEnglish
Article number100057
JournalNewton
Volume1
Issue number4
DOIs
StatePublished - 2 Jun 2025

Keywords

  • all-dielectric metasurfaces
  • flat-band
  • high-Q resonance
  • third-harmonic generation

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