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High-Q microresonators on a high-crystallinity homoepitaxial 3C-silicon carbide-on-insulator platform

  • Bingcheng Yang
  • , Bowen Chen
  • , Xuqiang Wang
  • , Tianyao Yang
  • , Weiran Zhou
  • , Qiudong Song
  • , Jian Zhang
  • , Jian Shen
  • , Chengli Wang
  • , Ya Cheng
  • , Ailun Yi
  • , Zhiwei Fang
  • , Xin Ou
  • CAS - Shanghai Institute of Microsystem and Information Technology
  • University of Chinese Academy of Sciences
  • East China Normal University

Research output: Contribution to journalArticlepeer-review

Abstract

Cubic silicon carbide (3C-SiC) is attractive for integrated photonics, yet heteroepitaxial films on silicon often limit microresonator quality factors (Q), while amorphous SiC (a-SiC) typically exhibits a nearly vanishing second-order nonlinearity. Here, we develop a homoepitaxial 3C-SiC-on-insulator (3C-SiCOI) platform via hydrophilic bonding and thinning. Using femtosecond laser direct writing combined with chemical mechanical polishing (CMP), we demonstrate suspended microdisk resonators with an intrinsic Q up to 1.2 × 106. To the best of our knowledge, this is the highest value reported for 3C-SiC microresonators. We further observe linear electro-optic tuning in a racetrack micro-ring resonator and estimate an effective electro-optic coefficient (r41) of 0.6 pm/V. These results bridge high optical quality and crystalline functionality, positioning homoepitaxial 3C-SiCOI as a platform for next-generation active SiC integrated photonics.

Original languageEnglish
Pages (from-to)2667-2673
Number of pages7
JournalPhotonics Research
Volume14
Issue number6
DOIs
StatePublished - 28 May 2026

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