High-Performance Tin-Halide Perovskite Transistors Enabled by Multiple A-Cation Engineering

  • Xiaomin Yang
  • , Yu Liu
  • , Shuzhang Yang
  • , Yanqiu Wu
  • , Yusheng Lei
  • , Yingguo Yang
  • , Ao Liu*
  • , Junhao Chu
  • , Wenwu Li*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

Metal-halide perovskite semiconductors have garnered great attention in optoelectronic devices due to their remarkable properties and processing capabilities. Among them, tin (Sn2+) perovskites stand out as promising candidates for use as channel layers in high-performance p-channel thin-film transistors (TFTs) owing to their excellent hole transport property. In this study, a multi A-cation approach is applied to pure Sn2+ perovskite, incorporating a small amount (7 mol%) of bulky PEA+ cation. This addition greatly improved the crystallinity and orientation of 3D FA0.9Cs0.1SnI3 perovskite, leading to optimized p-channel Sn2+-perovskite TFT with a hole mobility of ≈18 cm2 V−1 s−1, a high on/off current ratio of 108, and a small subthreshold swing of 0.5 V dec−1. These TFTs also exhibit a low contact resistance of 87 Ω·cm, attributed to the improved electrode/perovskite channel interface. Furthermore, the TFTs are utilized as an electrical characterization platform to study the charge transport properties and interfacial defects using the low-frequency noise method, providing insights into the interface properties of perovskite electronic devices.

Original languageEnglish
Article number2403917
JournalAdvanced Functional Materials
Volume34
Issue number40
DOIs
StatePublished - 1 Oct 2024
Externally publishedYes

Keywords

  • A-cation engineering
  • low-frequency noise analysis
  • thin-film transistors
  • tin halide perovskites

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