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Growth of carbon nanotube bundles on microscratched surfaces

  • Lei Huang
  • , S. P. Lau*
  • , Z. Sun
  • , Kenneth B.K. Teo
  • , B. K. Tay
  • *Corresponding author for this work
  • Nanyang Technological University
  • University of Cambridge

Research output: Contribution to journalArticlepeer-review

Abstract

In this paper, we demonstrated a roughness dependent chemical vapor deposition (CVD) process to selectively grow aligned carbon nanotube bundles on silicon substrates with microscratches. Our results show that the aligned nanotubes of uniform length (around 2 μm) and diameter (20-30 nm) are assembled to nanotube bundles and in-plane vertically aligned with the microscratches. The microscratch-selective nanotube growth offers a promising approach for the fabrication of 3-D nanotube architectures in a single CVD process.

Original languageEnglish
Pages (from-to)419-422
Number of pages4
JournalInternational Journal of Nanoscience
Volume4
Issue number4
DOIs
StatePublished - Aug 2005
Externally publishedYes

Keywords

  • Aligned carbon nanotubes
  • Carbon nanotubes
  • Chemical vapor deposition
  • Reactive ion etching

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