Growth and characterization of liquid-phase epitaxial Hg1-xCdxTe films

  • B. Li*
  • , X. Q. Chen
  • , J. H. Chu
  • , J. Y. Cao
  • , J. Q. Zhu
  • , D. Y. Tang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

In this paper, we report the liquid-phase epitaxy growth of Hg1-xCdxTe films from Te-rich solution in a vertical dipping reactor system. X-ray double-crystal diffraction, IR transmittance spectra and Hall measurement are carried out to characterize the quality of epilayers. By optimizing some key growth parameters such as vapour pressure, supercooling, cooling rate and stirring frequency, Hg1-xCdxTe epilayers in both the 3-5 μm and 8-14 μm ranges were grown with flatness surface and uniform composition (Δx ≤ 0.002). Run-to-run reproducibility of the p-type carrier concentrations after Hg annealing, were in the range of (0.5 ∼ 6) × 1016 cm-3, while the mobilities were no less than 180 cm2 V-1 s-1 at 77 K.

Original languageEnglish
Pages (from-to)1-5
Number of pages5
JournalThin Solid Films
Volume278
Issue number1-2
DOIs
StatePublished - 15 May 1996
Externally publishedYes

Keywords

  • Infrared spectroscopy
  • Liquid phase epitaxy
  • Mercury cadmium telluride
  • X-ray diffraction

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