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Growth and characterization of Hg1-xCdxTe by means of vertical dipping liquid-phase epitaxy

  • Xinqiang Chen*
  • , Junhao Chu
  • , Shuming Zhang
  • , Xiaoping Zhang
  • , Zhenzhong Yu
  • , Jie Zhou
  • , Sihao Xing
  • , Zeng Cai
  • , Huamei Ji
  • *Corresponding author for this work
  • CAS - Shanghai Institute of Technical Physics

Research output: Contribution to journalArticlepeer-review

Abstract

Growth of liquid-phase-epitaxial (LPE) layer Hg1-xCdxTe on CdTe or CdZnTe(111) substrate by means of vertical dipping method was reported in this paper. The samples composition X of LPE Hg1-xCdxTe is from 0.18 to 0.70 and composition uniformity is 0.001. The thickness and the area of LPE sample are about 20μm and 1.5×2cm2 respectively. After annealing for n-type Hg1-xCdxTe samples x=0.2, the electron concentration and mobility are about 1×1015cm-3 and 105cm2v·s at 77 k respectively, and the cavity concentration and mobility are about 2×1016 cm-3, 300 cm2v·s at 77 k respectively for p-type samples. The half peak width is 90 arc sec. The measurements of infrared spectroscopy, electrical parameters and carrier life-time demonstrate that the sample has good photoelectric properties.

Original languageEnglish
Pages (from-to)231-237
Number of pages7
JournalGongneng Cailiao/Journal of Functional Materials
Volume24
Issue number3
StatePublished - Jun 1993
Externally publishedYes

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