Abstract
Although graphene field-effect transistors (GFET) exhibit high carrier mobility and transconductance, they suffer from low output resistance, resulting in limited voltage and power gain. In this study, a heterogenous process is developed to integrate single-layer graphene with silicon-on-insulator (SOI) substrate, then achieving a groundbreaking high-gain cascode amplifier. By combining the advantages of high transconductance from GFET and high output resistance from SOI-FET, the heterogenous cascode amplifier shows high output resistance and high voltage gain. Moreover, the heterogenous cascode amplifier demonstrates a significant improvement in transconductance (12.6 times of SOI-FET) and output resistance (98.7 times of GFET). A maximum gain of up to 80 is obtained by optimizing the bias conditions, vastly exceeding that of standalone GFET and SOI-FET devices. This graphene/SOI heterogenous cascode amplifier exhibits promising applications in radio-frequency transistor technology and wireless communication.
| Original language | English |
|---|---|
| Pages (from-to) | 2209-2212 |
| Number of pages | 4 |
| Journal | IEEE Electron Device Letters |
| Volume | 45 |
| Issue number | 11 |
| DOIs | |
| State | Published - 2024 |
| Externally published | Yes |
Keywords
- Cascode amplifier
- graphene field effect transistor
- heterogenous process
- high gain
- silicon-on-insulator
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