Abstract
Graphene-based films have intrinsic good performances among various transparent conductive films (TCFs). Here we described a promising way to further improve the transmittance of graphene-based TCFs under the premise of good conductivity by introducing antireflection nanostructure. A SiO2 nanoporous structure dip-coated on quartz substrate acts as an antireflection layer, followed with direct growth of graphene using remote catalyzation of Cu nanoparticles by ambient pressure chemical vapor deposition to obtain the composite TCFs. Further investigations show that the composite TCFs achieve a transmittance of 95.9%, increased by 6.2% to graphene/quartz film and a sheet resistance of 0.6 kΩ·sq− 1, reduced by 0.65 kΩ·sq− 1. This method avoids transferring graphene and enhances the transmittance and conductivity of TCFs simultaneously, which has the advantages of low cost, easy operating and indicates the potential applications of composite TCFs in many photoelectric devices.
| Original language | English |
|---|---|
| Pages (from-to) | 611-616 |
| Number of pages | 6 |
| Journal | Surface and Coatings Technology |
| Volume | 325 |
| DOIs | |
| State | Published - 25 Sep 2017 |
Keywords
- Antireflection nanostructure
- Chemical vapor deposition
- Graphene
- Remote catalyzation
- Transparent conductive films