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Gas-Phase Preparation of Silyl Cyanide (SiH3CN) via a Radical Substitution Mechanism

  • Zhenghai Yang
  • , Chao He
  • , Shane J. Goettl
  • , Dababrata Paul
  • , Ralf I. Kaiser*
  • , Mateus X. Silva
  • , Breno R.L. Galvaõ*
  • *Corresponding author for this work
  • University of Hawai'i at Mānoa
  • Centro Federal de Educação Tecnológica de Minas Gerais

Research output: Contribution to journalArticlepeer-review

Abstract

The silyl cyanide (SiH3CN) molecule, the simplest representative of a fully saturated silacyanide, was prepared in the gas phase under single-collision conditions via a radical substitution mechanism. The chemical dynamics were direct and revealed a pronounced backward scattering as a consequence of a transition state with a pentacoordinated silicon atom and almost colinear geometry of the attacking cyano radical and leaving hydrogen. Compared to the isovalent cyano (CN)−methane (CH4) system, the CN−SiH4 system dramatically reduces the energy of the transition state to silyl cyanide by nearly 100 kJ mol−1, which reveals a profound effect on the chemical bonding and reaction mechanism. In extreme high-temperature environments including circumstellar envelopes of IRC +10216, this versatile radical substitution mechanism may synthesize organosilicon molecules via reactions of silane with doublet radicals. Overall, this study provides rare insights into the exotic reaction mechanisms of main-group XIV elements in extreme environments and affords deeper insights into fundamental molecular mass growth processes involving silicon in our universe.

Original languageEnglish
Pages (from-to)8649-8657
Number of pages9
JournalJournal of the American Chemical Society
Volume144
Issue number19
DOIs
StatePublished - 18 May 2022
Externally publishedYes

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