Formation of Si nanocrystals in glass by femtosecond laser micromachining

Geng Lin; Huaihai Pan; Ye Dai; Fei He; Danping Chen; Ya Cheng; Xiongwei Jiang; Long Zhang; Jianrong Qiu; Quanzhong Zhao

doi:10.1016/j.matlet.2011.07.106

Formation of Si nanocrystals in glass by femtosecond laser micromachining

Geng Lin, Huaihai Pan, Ye Dai, Fei He, Danping Chen, Ya Cheng, Xiongwei Jiang, Long Zhang, Jianrong Qiu^*, Quanzhong Zhao

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

We report on the precipitation of Si nanocrystals inside a borosilicate glass by using an 800 nm, 250 kHz femtosecond laser irradiation, which was confirmed with X-ray diffraction, Raman spectra and transmission electron microscopy analyses. Refractive index profile reveals that the refractive index of the Si nanocrystals precipitated region increased up to 8.7% in comparison with that of the unirradiated area, leading to a large diffraction efficiency of the fabricated dot structure. Furthermore, the third-order optical nonlinearity of the Si nanocrystals precipitated glass is greatly enhanced based on the Z-scan measurement. These results may find applications for the fabrication diffractive optical devices and optical switches. Crown

Original language	English
Pages (from-to)	3544-3547
Number of pages	4
Journal	Materials Letters
Volume	65
Issue number	23-24
DOIs	https://doi.org/10.1016/j.matlet.2011.07.106
State	Published - Dec 2011
Externally published	Yes

Keywords

Laser processing
Nanocrystalline materials
Optical materials and properties

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10.1016/j.matlet.2011.07.106

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title = "Formation of Si nanocrystals in glass by femtosecond laser micromachining",

abstract = "We report on the precipitation of Si nanocrystals inside a borosilicate glass by using an 800 nm, 250 kHz femtosecond laser irradiation, which was confirmed with X-ray diffraction, Raman spectra and transmission electron microscopy analyses. Refractive index profile reveals that the refractive index of the Si nanocrystals precipitated region increased up to 8.7\% in comparison with that of the unirradiated area, leading to a large diffraction efficiency of the fabricated dot structure. Furthermore, the third-order optical nonlinearity of the Si nanocrystals precipitated glass is greatly enhanced based on the Z-scan measurement. These results may find applications for the fabrication diffractive optical devices and optical switches. Crown",

keywords = "Laser processing, Nanocrystalline materials, Optical materials and properties",

author = "Geng Lin and Huaihai Pan and Ye Dai and Fei He and Danping Chen and Ya Cheng and Xiongwei Jiang and Long Zhang and Jianrong Qiu and Quanzhong Zhao",

year = "2011",

month = dec,

doi = "10.1016/j.matlet.2011.07.106",

language = "英语",

volume = "65",

pages = "3544--3547",

journal = "Materials Letters",

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TY - JOUR

T1 - Formation of Si nanocrystals in glass by femtosecond laser micromachining

AU - Lin, Geng

AU - Pan, Huaihai

AU - Dai, Ye

AU - He, Fei

AU - Chen, Danping

AU - Cheng, Ya

AU - Jiang, Xiongwei

AU - Zhang, Long

AU - Qiu, Jianrong

AU - Zhao, Quanzhong

PY - 2011/12

Y1 - 2011/12

N2 - We report on the precipitation of Si nanocrystals inside a borosilicate glass by using an 800 nm, 250 kHz femtosecond laser irradiation, which was confirmed with X-ray diffraction, Raman spectra and transmission electron microscopy analyses. Refractive index profile reveals that the refractive index of the Si nanocrystals precipitated region increased up to 8.7% in comparison with that of the unirradiated area, leading to a large diffraction efficiency of the fabricated dot structure. Furthermore, the third-order optical nonlinearity of the Si nanocrystals precipitated glass is greatly enhanced based on the Z-scan measurement. These results may find applications for the fabrication diffractive optical devices and optical switches. Crown

AB - We report on the precipitation of Si nanocrystals inside a borosilicate glass by using an 800 nm, 250 kHz femtosecond laser irradiation, which was confirmed with X-ray diffraction, Raman spectra and transmission electron microscopy analyses. Refractive index profile reveals that the refractive index of the Si nanocrystals precipitated region increased up to 8.7% in comparison with that of the unirradiated area, leading to a large diffraction efficiency of the fabricated dot structure. Furthermore, the third-order optical nonlinearity of the Si nanocrystals precipitated glass is greatly enhanced based on the Z-scan measurement. These results may find applications for the fabrication diffractive optical devices and optical switches. Crown

KW - Laser processing

KW - Nanocrystalline materials

KW - Optical materials and properties

UR - https://www.scopus.com/pages/publications/80052025466

U2 - 10.1016/j.matlet.2011.07.106

DO - 10.1016/j.matlet.2011.07.106

M3 - 文章

AN - SCOPUS:80052025466

SN - 0167-577X

VL - 65

SP - 3544

EP - 3547

JO - Materials Letters

JF - Materials Letters

IS - 23-24

ER -

Formation of Si nanocrystals in glass by femtosecond laser micromachining

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Keywords

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