Field emission properties and surface structure of nickel containing amorphous carbon

G. Y. Chen; J. S. Chen; Z. Sun; Y. J. Li; S. P. Lau; B. K. Tay; J. W. Chai

doi:10.1016/S0169-4332(01)00328-2

Field emission properties and surface structure of nickel containing amorphous carbon

G. Y. Chen^*
, J. S. Chen
, Z. Sun
, Y. J. Li
, S. P. Lau
, B. K. Tay
, J. W. Chai

^*Corresponding author for this work

Nanyang Technological University
Agency for Science, Technology and Research, Singapore

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm ^-1 , whilst the threshold field of the ta-C film is about 13 V μm ^-1 . Raman spectroscopy suggests that the sp ² clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm ^-1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.

Original language	English
Pages (from-to)	185-190
Number of pages	6
Journal	Applied Surface Science
Volume	180
Issue number	3-4
DOIs	https://doi.org/10.1016/S0169-4332(01)00328-2
State	Published - 16 Aug 2001
Externally published	Yes

Keywords

Amorphous carbon (ta-C)
Indium-tin-oxide (ITO)
Tetrahedral amorphous carbon (ta-C)

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10.1016/S0169-4332(01)00328-2

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@article{5572d7edfb6d48c891c945b765423493,

title = "Field emission properties and surface structure of nickel containing amorphous carbon",

abstract = " Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm -1 , whilst the threshold field of the ta-C film is about 13 V μm -1 . Raman spectroscopy suggests that the sp 2 clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm -1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.",

keywords = "Amorphous carbon (ta-C), Indium-tin-oxide (ITO), Tetrahedral amorphous carbon (ta-C)",

author = "Chen, \{G. Y.\} and Chen, \{J. S.\} and Z. Sun and Li, \{Y. J.\} and Lau, \{S. P.\} and Tay, \{B. K.\} and Chai, \{J. W.\}",

year = "2001",

month = aug,

day = "16",

doi = "10.1016/S0169-4332(01)00328-2",

language = "英语",

volume = "180",

pages = "185--190",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Field emission properties and surface structure of nickel containing amorphous carbon

AU - Chen, G. Y.

AU - Chen, J. S.

AU - Sun, Z.

AU - Li, Y. J.

AU - Lau, S. P.

AU - Tay, B. K.

AU - Chai, J. W.

PY - 2001/8/16

Y1 - 2001/8/16

N2 - Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm -1 , whilst the threshold field of the ta-C film is about 13 V μm -1 . Raman spectroscopy suggests that the sp 2 clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm -1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.

AB - Nickel containing amorphous carbon (a-C:Ni) films have been deposited by filtered cathodic vacuum arc (FCVA) technique by introducing pure nickel into the graphite target. The field electron emission property of a-C:Ni was improved when compared to that of pure tetrahedral amorphous carbon (ta-C) by FCVA. The emission threshold field of a-C:Ni film is about 5 V μm -1 , whilst the threshold field of the ta-C film is about 13 V μm -1 . Raman spectroscopy suggests that the sp 2 clusters in the carbon film increase both in size and number when Ni is introduced. However, the emission was found to degrade to threshold fields beyond 20 V μm -1 after the a-C:Ni film was left in ambient for a week. This observation is attributed to surface absorption of oxygen on the a-C:Ni film, as determined by X-ray Photoelectron Spectroscopy.

KW - Amorphous carbon (ta-C)

KW - Indium-tin-oxide (ITO)

KW - Tetrahedral amorphous carbon (ta-C)

UR - https://www.scopus.com/pages/publications/0035899520

U2 - 10.1016/S0169-4332(01)00328-2

DO - 10.1016/S0169-4332(01)00328-2

M3 - 文章

AN - SCOPUS:0035899520

SN - 0169-4332

VL - 180

SP - 185

EP - 190

JO - Applied Surface Science

JF - Applied Surface Science

IS - 3-4

ER -

Field emission properties and surface structure of nickel containing amorphous carbon

Abstract

Keywords

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