Abstract
LaNiO3 (LNO) films with a surface roughness rms of 0.384 nm and a sheet resistance of about 200 Ω were prepared on SrTiO3 and Si/SiO2 substrates respectively by rf magnetron sputtering technique. The surface of LNO on Si/SiO2 substrate is smoother than that on SrTiO3 substrate. A nominal 2-monolayer (ML) poly(vinylidenefluoride- trifluoroethylene) film with a thickness of about 3 nm was deposited on LNO coated Si/SiO2 substrate by Langmuir-Blodgett (LB) technology. Piezoresponse force microscopy (PFM) measurements show that the LB films demonstrate an obvious feature of polarization switching and good voltage durability. The results suggest that the ultrathin polymer films may be utilized to explore ferroelectric tunnel junctions.
| Original language | English |
|---|---|
| Pages (from-to) | 1989-1991 |
| Number of pages | 3 |
| Journal | Materials Letters |
| Volume | 65 |
| Issue number | 12 |
| DOIs | |
| State | Published - 30 Jun 2011 |
| Externally published | Yes |
Keywords
- Ferroelectric tunnel junctions
- Ferroelectricity
- LB films
- LaNiO films