Femtosecond laser-induced damage in reflector

  • Haiyi Sun*
  • , Tianqing Jia
  • , Xiaoxi Li
  • , Chengbin Li
  • , Donghai Feng
  • , Shizhen Xu
  • , Xiaochun Ge
  • , Zhizhan Xu
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

We have investigated the damage for ZrO 2 /SiO 2 800 nm 45° high-reflection mirror with femtosecond pulses. The damage morphologies and the evolution of ablation crater depths with laser fluences are dramatically different from that with pulse longer than a few tens of picoseconds. The ablation in multilayers occurs layer by layer, and not continuously as in the case of bulk single crystalline or amorphous materials. The weak point in damage is the interface between two layers. We also report its single-short damage thresholds for pulse durations ranging from 50 to 900 fs, which departs from the diffusion-dominated τ P 1 / 2 scaling. A developed avalanche model, including the production of conduction band electrons (CBE) and laser energy deposition, is applied to study the damage mechanisms. The theoretical results agree well with our measurements.

Original languageEnglish
Pages (from-to)5109-5115
Number of pages7
JournalApplied Surface Science
Volume252
Issue number14
DOIs
StatePublished - 15 May 2006
Externally publishedYes

Keywords

  • 45° high-reflection mirror
  • Ablation depth
  • Damage threshold
  • Femtosecond laser

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