Femtosecond-laser-assisted wet chemical etching of polymer materials

C. Wochnowski; Y. Hanada; Y. Cheng; S. Metev; F. Vollertsen; K. Sugioka; K. Midorikawa

doi:10.1002/app.23492

Femtosecond-laser-assisted wet chemical etching of polymer materials

C. Wochnowski^*
, Y. Hanada
, Y. Cheng
, S. Metev
, F. Vollertsen
, K. Sugioka
, K. Midorikawa

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Polymers are modified by femtosecond-(fs)-IR-laser irradiation under various process parameters. Several sorts of thermoplastic polymer are employed: polym-ethylmethacrylate (PMMA), fluorinated PMMA, poly-N-methyl methacrylimide (PMMI), polystyrol, polycarbonate, polyimide, and polyethylene. After the fs-laser-induced modification process, the irradiated area is developed by an aqueous solution of a solvent agent (n-hexane, benzene, and methylisobutylketone). The surface topography of the fs-laser-irradiated area is characterized by stylus-profilometry before and after the development procedure. Some preliminary explanations are given about the solution mechanism of the fs-laser-irradiated polymer region. The experimental results are relevant for the fabrication of three-dimensional (3D)-structures in the volume of a transparent polymer material by fs-laser irradiation.

Original language	English
Pages (from-to)	1229-1238
Number of pages	10
Journal	Journal of Applied Polymer Science
Volume	100
Issue number	2
DOIs	https://doi.org/10.1002/app.23492
State	Published - 15 Apr 2006
Externally published	Yes

Keywords

Laser ablation
Microstructuring
Modification
Solution properties
Surface

Access to Document

10.1002/app.23492

Cite this

@article{8ddb70da73a74f5dab4111e3ceb08fc6,

title = "Femtosecond-laser-assisted wet chemical etching of polymer materials",

abstract = "Polymers are modified by femtosecond-(fs)-IR-laser irradiation under various process parameters. Several sorts of thermoplastic polymer are employed: polym-ethylmethacrylate (PMMA), fluorinated PMMA, poly-N-methyl methacrylimide (PMMI), polystyrol, polycarbonate, polyimide, and polyethylene. After the fs-laser-induced modification process, the irradiated area is developed by an aqueous solution of a solvent agent (n-hexane, benzene, and methylisobutylketone). The surface topography of the fs-laser-irradiated area is characterized by stylus-profilometry before and after the development procedure. Some preliminary explanations are given about the solution mechanism of the fs-laser-irradiated polymer region. The experimental results are relevant for the fabrication of three-dimensional (3D)-structures in the volume of a transparent polymer material by fs-laser irradiation.",

keywords = "Laser ablation, Microstructuring, Modification, Solution properties, Surface",

author = "C. Wochnowski and Y. Hanada and Y. Cheng and S. Metev and F. Vollertsen and K. Sugioka and K. Midorikawa",

year = "2006",

month = apr,

day = "15",

doi = "10.1002/app.23492",

language = "英语",

volume = "100",

pages = "1229--1238",

journal = "Journal of Applied Polymer Science",

issn = "0021-8995",

publisher = "John Wiley \& Sons Inc.",

number = "2",

}

TY - JOUR

T1 - Femtosecond-laser-assisted wet chemical etching of polymer materials

AU - Wochnowski, C.

AU - Hanada, Y.

AU - Cheng, Y.

AU - Metev, S.

AU - Vollertsen, F.

AU - Sugioka, K.

AU - Midorikawa, K.

PY - 2006/4/15

Y1 - 2006/4/15

N2 - Polymers are modified by femtosecond-(fs)-IR-laser irradiation under various process parameters. Several sorts of thermoplastic polymer are employed: polym-ethylmethacrylate (PMMA), fluorinated PMMA, poly-N-methyl methacrylimide (PMMI), polystyrol, polycarbonate, polyimide, and polyethylene. After the fs-laser-induced modification process, the irradiated area is developed by an aqueous solution of a solvent agent (n-hexane, benzene, and methylisobutylketone). The surface topography of the fs-laser-irradiated area is characterized by stylus-profilometry before and after the development procedure. Some preliminary explanations are given about the solution mechanism of the fs-laser-irradiated polymer region. The experimental results are relevant for the fabrication of three-dimensional (3D)-structures in the volume of a transparent polymer material by fs-laser irradiation.

AB - Polymers are modified by femtosecond-(fs)-IR-laser irradiation under various process parameters. Several sorts of thermoplastic polymer are employed: polym-ethylmethacrylate (PMMA), fluorinated PMMA, poly-N-methyl methacrylimide (PMMI), polystyrol, polycarbonate, polyimide, and polyethylene. After the fs-laser-induced modification process, the irradiated area is developed by an aqueous solution of a solvent agent (n-hexane, benzene, and methylisobutylketone). The surface topography of the fs-laser-irradiated area is characterized by stylus-profilometry before and after the development procedure. Some preliminary explanations are given about the solution mechanism of the fs-laser-irradiated polymer region. The experimental results are relevant for the fabrication of three-dimensional (3D)-structures in the volume of a transparent polymer material by fs-laser irradiation.

KW - Laser ablation

KW - Microstructuring

KW - Modification

KW - Solution properties

KW - Surface

UR - https://www.scopus.com/pages/publications/33645134953

U2 - 10.1002/app.23492

DO - 10.1002/app.23492

M3 - 文章

AN - SCOPUS:33645134953

SN - 0021-8995

VL - 100

SP - 1229

EP - 1238

JO - Journal of Applied Polymer Science

JF - Journal of Applied Polymer Science

IS - 2

ER -

Femtosecond-laser-assisted wet chemical etching of polymer materials

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this