Fast preparation of controllable nitrogen-atom-substituted graphyne film for use in field effect transistor devices

  • Ze Yang
  • , Xin Ren
  • , Xiaodi Ma
  • , Yuwei Song
  • , Xiuli Hu
  • , Mingjia Zhang
  • , Yuan Li
  • , Chipeng Xie
  • , Xiaodong Li
  • , Jiazhu Li
  • , Changshui Huang*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

It has been predicted that the introduction of heteroatoms into graphyne (GY) will be able to improve the properties of GY and increase its range of applications. However, it is difficult to synthesize GY, which is linked through only one acetylenic bond (-CC-) between any two adjacent benzene rings. Herein, we demonstrate an innovative interfacial synthetic method for rapid preparation of nitrogen-substituted GY (N-GY) films. Notably, as-prepared N-GY films that offer a determined morphology and well-established N atoms can be utilized as semiconductor films for field-effect transistor (FET) devices. With the increase in the number of N atoms in N-GY films, the carrier mobility of the prepared FET devices based on those N-GY films was increased. An average mobility of 9.8 cm2 V-1 s-1 with a gate operating voltage lower than 5 V was measured for such rapidly prepared N-GY films, implying that interfacial synthesis can provide a facile avenue to obtain GY-based electronic materials. Thus, GY-based materials have the potential to become very promising candidates for incorporation into electronic devices.

Original languageEnglish
Pages (from-to)7993-8001
Number of pages9
JournalMaterials Chemistry Frontiers
Volume5
Issue number22
DOIs
StatePublished - 21 Nov 2021
Externally publishedYes

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