Fabrication of a reflective mirror within wide incidence angles for mid-infrared wavelength

Miao Fengjuan, Zhang Jie, Xu Sliaohui, Wang Lianwei, Chu Junhao, Cao Zhishen, Zhan Peng, Wang Zhenlin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

One-dimensional (1-D) photonic crystal with photonic band-gap based on porous silicon is fabricated with alternative etching currents during anodization. The microstructure was characterized by scanning electron microscopy and the optical reflectance spectra by Fourier transform infrared spectroscopy. A band-gap centered at 6 microns with a bandwidth of 3 microns has been successfully obtained. The prepared multilayer structure can reflect mid-infrared within a wide incidence angle up to 50°. After proper oxidation process, its thermal properties can be improved significantly, and meanwhile the band-gap only slightly shifts to that centered at 5.7 microns. PECVD of Si3N4 is employed to improve the surface morphology in order to make the structure suitable to the fabrication of sensors. It is found that deposition of Si3N4 does not change the reflectance properties of the structures.

Original languageEnglish
Title of host publicationMETA08 - Proceedings of the 2008 International Workshop on Metamaterials
Pages173-176
Number of pages4
DOIs
StatePublished - 2008
Event2008 International Workshop on Metamaterials, META08 - Nanjing, China
Duration: 9 Nov 200812 Nov 2008

Publication series

NameMETA08 - Proceedings of the 2008 International Workshop on Metamaterials

Conference

Conference2008 International Workshop on Metamaterials, META08
Country/TerritoryChina
CityNanjing
Period9/11/0812/11/08

Keywords

  • Anodization
  • FTIR
  • Multilayer structure
  • Oxidation
  • PECVD of SiN
  • Wide angle

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