Fabrication and optical property of two-dimensional infrared photonic crystals by deep reactive ion etching in Si

  • Mei Zhou*
  • , Xiao Shuang Chen
  • , Yong Zeng
  • , Jing Xu
  • , Shao Wei Wang
  • , Wei Lu
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report the fabrication and characterization of two-dimensional silicon-based photonic crystal structures realized by deep reactive ion etching method. Photonic crystals of square and triangular lattices with very high aspect ratios up to 33 have been achieved. Photonic bandgap behaviors are identified by the transmission and reflection spectra measured by using a Fourier transform infrared spectrometer. The experiment results are in good agreement with calculated band structures.

Original languageEnglish
Title of host publicationConference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics
EditorsM. Thumm, W. Wiesbeck
Pages183-184
Number of pages2
StatePublished - 2004
Externally publishedYes
EventConference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics - Karlsruhe, Germany
Duration: 27 Sep 20041 Oct 2004

Publication series

NameConference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics

Conference

ConferenceConference Digest of the 2004 Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics
Country/TerritoryGermany
CityKarlsruhe
Period27/09/041/10/04

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