@article{6e5bc4c6cec346f59c5ae04b1cbba95f,
title = "Evolution of Filament Formation in Ni/HfO2/SiOx/Si-Based RRAM Devices",
keywords = "energy dispersive X-ray spectrometry, in situ transmission electron microscopy, metal nanofilaments, resistive random access memory",
author = "Xing Wu and Sen Mei and Michel Bosman and Nagarajan Raghavan and Xixiang Zhang and Dongkyu Cha and Kun Li and Pey, \{Kin Leong\}",
year = "2015",
month = nov,
doi = "10.1002/aelm.201500130",
language = "英语",
volume = "1",
journal = "Advanced Electronic Materials",
issn = "2199-160X",
publisher = "John Wiley and Sons Inc",
number = "11",
}