Epitaxial growth of Yb/Er co-doped HfO2 films with coexisting ferroelectric and luminescent properties

  • Jie Tu
  • , Yingjia Li
  • , Erxiang Tang
  • , Xiaoyu Qiu
  • , Xiang Xu
  • , Zijian Chen
  • , Yujie Zhou
  • , Chen Zhou
  • , Zhao Guan
  • , Ni Zhong
  • , Pinghua Xiang
  • , Binbin Chen*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

We report on the fabrication of high-quality Yb3+ and Er3+ co-doped HfO2 epitaxial films using pulsed laser deposition. The host material HfO2 has relatively low phonon energy, which is desirable to inhibit the nonradiative relaxation. The dopant Yb3+ is used to stabilize the ferroelectric o-phase and also acts as the sensitizer to enhance the optical absorption cross section, while Er3+ is the luminescence activator. The films exhibit robust ferroelectricity with a remanent polarization of 12 μC/cm2 and comparable endurance performance to HfO2-based epitaxial films reported before. The up- and downconversion luminescence properties were ascertained by photoluminescence spectroscopy. The Yb3+/Er3+ co-doped HfO2 films with coexisting ferroelectric and luminescent functionalities may suggest a promising approach toward electric field tunable phosphors.

Original languageEnglish
Article number212901
JournalApplied Physics Letters
Volume126
Issue number21
DOIs
StatePublished - 26 May 2025

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