Abstract
Si nanocrystals embedded in SiO 2 (Si-NCs/SiO 2 ) with efficient light emission were prepared by N 2 -annealing of amorphous SiO x (a-SiO x ) and subsequent H 2 -passivation, and the effects of passivation on the photoluminescence (PL) from Si-NCs/SiO 2 were studied. The H 2 -passivation was performed in a mixed gas of 5% H 2 + 95% N 2 at temperatures ranging from 400 to 700 C for varied times, which is effective for passivating dangling bonds and enhancing luminescence. The PL intensity increases with passivation time, shortly followed by a saturation that depends on the passivation temperature. The H 2 -passivation also results in a red shift of PL spectra. The effects of H 2 -passivation show nearly complete reversibility as revealed by the emitted luminescence. Subsequent heating of the passivated samples in N 2 has an effect of depassivation which regenerates dangling bonds and the regenerated dangling bonds can also be passivated. Si-NCs/SiO 2 are found to exhibit stable behaviors in passivation and depassivation processes after three cycles of passivation and depassivation treatments.
| Original language | English |
|---|---|
| Pages (from-to) | 178-183 |
| Number of pages | 6 |
| Journal | Applied Surface Science |
| Volume | 300 |
| DOIs | |
| State | Published - 1 May 2014 |
Keywords
- Depassivation
- Passivation
- Photoluminescence
- Si nanocrystal
- Stability