Enhancement and stability of photoluminescence from Si nanocrystals embedded in a SiO 2 matrix by H 2 -passivation

  • Yanli Li
  • , Peipei Liang
  • , Zhigao Hu
  • , Shuang Guo
  • , Qinghu You
  • , Jian Sun
  • , Ning Xu
  • , Jiada Wu*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

Si nanocrystals embedded in SiO 2 (Si-NCs/SiO 2 ) with efficient light emission were prepared by N 2 -annealing of amorphous SiO x (a-SiO x ) and subsequent H 2 -passivation, and the effects of passivation on the photoluminescence (PL) from Si-NCs/SiO 2 were studied. The H 2 -passivation was performed in a mixed gas of 5% H 2 + 95% N 2 at temperatures ranging from 400 to 700 C for varied times, which is effective for passivating dangling bonds and enhancing luminescence. The PL intensity increases with passivation time, shortly followed by a saturation that depends on the passivation temperature. The H 2 -passivation also results in a red shift of PL spectra. The effects of H 2 -passivation show nearly complete reversibility as revealed by the emitted luminescence. Subsequent heating of the passivated samples in N 2 has an effect of depassivation which regenerates dangling bonds and the regenerated dangling bonds can also be passivated. Si-NCs/SiO 2 are found to exhibit stable behaviors in passivation and depassivation processes after three cycles of passivation and depassivation treatments.

Original languageEnglish
Pages (from-to)178-183
Number of pages6
JournalApplied Surface Science
Volume300
DOIs
StatePublished - 1 May 2014

Keywords

  • Depassivation
  • Passivation
  • Photoluminescence
  • Si nanocrystal
  • Stability

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