Abstract
Manganese-dioxide is electrodeposited on three-dimensional nickel/silicon microchannel plates (Si-MCPs) to produce miniature supercapacitors. The nanostructured MnO2 thin film can be clearly observed from the channels and largely contribute to the capacitance. The compositions and morphology are characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). The electrochemical properties are investigated by cyclic voltammetry (CV), galvanostatic charging-discharging, and electrochemical impedance spectroscopy (EIS) in a neutral 1 M Na 2SO4 solution which preserves the structure of the substrate. The capacitance is 0.961 F/cm2 or 323.1 F/g and the retention ratio is 91.1% after 1000 cycles thereby demonstrating the robustness and durability.
| Original language | English |
|---|---|
| Pages (from-to) | 116-118 |
| Number of pages | 3 |
| Journal | Materials Letters |
| Volume | 126 |
| DOIs | |
| State | Published - 1 Jul 2014 |
Keywords
- Deposition
- Silicon microchannel plates (Si-MCPs)
- Supercapacitor
- Thin films