Electrodeposition of nanostructured MnO2 electrode on three-dimensional nickel/silicon microchannel plates for miniature supercapacitors

  • Yuwei Xu
  • , Shaohui Xu*
  • , Mai Li
  • , Yiping Zhu
  • , Lianwei Wang
  • , Paul K. Chu
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

Manganese-dioxide is electrodeposited on three-dimensional nickel/silicon microchannel plates (Si-MCPs) to produce miniature supercapacitors. The nanostructured MnO2 thin film can be clearly observed from the channels and largely contribute to the capacitance. The compositions and morphology are characterized by X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). The electrochemical properties are investigated by cyclic voltammetry (CV), galvanostatic charging-discharging, and electrochemical impedance spectroscopy (EIS) in a neutral 1 M Na 2SO4 solution which preserves the structure of the substrate. The capacitance is 0.961 F/cm2 or 323.1 F/g and the retention ratio is 91.1% after 1000 cycles thereby demonstrating the robustness and durability.

Original languageEnglish
Pages (from-to)116-118
Number of pages3
JournalMaterials Letters
Volume126
DOIs
StatePublished - 1 Jul 2014

Keywords

  • Deposition
  • Silicon microchannel plates (Si-MCPs)
  • Supercapacitor
  • Thin films

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