Effect of substitution of vanadium on the structure and electrical properties of Bi3.25La0.75Ti3O12 thin films

  • X. J. Meng*
  • , J. H. Ma
  • , J. L. Sun
  • , T. Lin
  • , J. Yu
  • , G. S. Wang
  • , J. H. Chu
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

The ferroelectric and dielectric properties of Bi4-xLa xTi3O12 (BLT) and B4-xLa xTi2.97O12 (BLTV) thin films deposited on (111)Pt/Ti/SiO2/Si substrates using a chemical solution method were investigated. The BLTV thin films showed a larger remanent polarization (9.6 μC/cm2) than the BLT thin films (6.5 μC/cm2), while the coercive field for both thin films was nearly the same. The capacitance of the films as a function of a small ac driving field was measured, and the data were processed using Rayleigh's law. The results show that the Rayleigh constant of the BLT films was smaller than that of the BLTV films, indicating that the defect concentration was lower in the latter case. The superior ferroelectricity of the BLTV films was attributed to a decrease of both the (001) orientation and the defect concentration.

Original languageEnglish
Pages (from-to)1089-1091
Number of pages3
JournalApplied Physics A: Materials Science and Processing
Volume78
Issue number7
DOIs
StatePublished - Apr 2004
Externally publishedYes

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