Effect of molecular structure of imidazoline inhibitors on growth and decay laws of films formed on Q235 steel

Jing Zhang, Min Du, Hui Hua Yu, Ning Wang

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

Inhibition performance as well as the growth and decay laws of films formed on Q235 steel in a saturated carbon dioxide salt solution of imidazoline and imidazoline with a thioureido group were investigated by polarization curve and electrochemical impedance spectroscopy (EIS) techniques. Results showed that both types of imidazoline derivative inhibitors were mix-type inhibitors which mainly inhibited anodic processes. At 85 °C, the film formed in 40 mg ·L-1 of the non-thioureido imidazoline inhibitor formed slowly and had poorer adsorption capability than the thioureido-containing imidazoline inhibitor. The non-thioureido imidazoline inhibitor also disrobed easily from the steel. The film of thioureido-containing imidazoline can auto-repair itself. It also had better adsorption and inhibition efficiency compared with the non-thioureido imidazoline inhibitor. The hydrolyzed imidazoline with a thioureido group has poor absorption capability and its film life and inhibition efficiency decreased compared with the thioureido-containing imidazoline inhibitor. In this paper electrochemical results are also explained using quantum chemistry analysis.

Original languageEnglish
Pages (from-to)525-531
Number of pages7
JournalWuli Huaxue Xuebao/ Acta Physico - Chimica Sinica
Volume25
Issue number3
DOIs
StatePublished - Mar 2009
Externally publishedYes

Keywords

  • Electrochemical impedance spectroscopy
  • Imidazoline inhibitor membrane
  • Molecular structure
  • Polarization curve
  • Quantum chemistry

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