Directed Gas Phase Formation of the Elusive Silylgermylidyne Radical (H₃SiGe, X²A′′)

The previously unknown silylgermylidyne radical (H₃SiGe; X²A′′) was prepared via the bimolecular gas phase reaction of ground state silylidyne radicals (SiH; X²Π) with germane (GeH₄; X¹A₁) under single collision conditions in crossed molecular beams experiments. This reaction begins with the formation of a van der Waals complex followed by insertion of silylidyne into a germanium-hydrogen bond forming the germylsilyl radical (H₃GeSiH₂). A hydrogen migration isomerizes this intermediate to the silylgermyl radical (H₂GeSiH₃), which undergoes a hydrogen shift to an exotic, hydrogen-bridged germylidynesilane intermediate (H₃Si(μ-H)GeH); this species emits molecular hydrogen forming the silylgermylidyne radical (H₃SiGe). Our study offers a remarkable glance at the complex reaction dynamics and inherent isomerization processes of the silicon-germanium system, which are quite distinct from those of the isovalent hydrocarbon system (ethyl radical; C₂H₅) eventually affording detailed insights into an exotic chemistry and intriguing chemical bonding of silicon-germanium species at the microscopic level exploiting crossed molecular beams.