Dielectric responses and scaling behaviors in Aurivillius Bi 6Ti 3Fe 2O 18 multiferroic thin films

W. Bai, G. Chen, J. Y. Zhu, J. Yang, T. Lin, X. J. Meng, X. D. Tang, C. G. Duan, J. H. Chu

Research output: Contribution to journalArticlepeer-review

89 Scopus citations

Abstract

Dielectric responses and scaling behaviors of Aurivillius Bi 6Ti 3Fe 2O 18 (BTF2) multiferroic thin films were systemically detailed by the temperature-dependent dielectric/impedance spectroscopy. We clarified two dielectric relaxation processes presented in grain interior of the BTF2 films. One relaxation below ∼500 K was proposed to associate with the localized hopping process of carrier between Fe 3 and Fe 2 inside the grains. Another one above ∼500 K arose from the long-range movement of oxygen vacancies. The scaling behaviors implied that the distribution of relaxation times for oxygen vacancies was temperature independent while the dynamical processes for the hopping carriers presumably depended on temperature.

Original languageEnglish
Article number082902
JournalApplied Physics Letters
Volume100
Issue number8
DOIs
StatePublished - 20 Feb 2012

Fingerprint

Dive into the research topics of 'Dielectric responses and scaling behaviors in Aurivillius Bi 6Ti 3Fe 2O 18 multiferroic thin films'. Together they form a unique fingerprint.

Cite this