Abstract
Diamond films have been deposited on carbon films that were deposited from electrolysis of an ethanol on Si by hot-filament chemical vapor deposition system. The nucleation density of the diamond on carbon-Si substrates of about 108-1010 cm-2 has been achieved. The diamond nucleation and morphology mainly depend on the morphology (thickness) of carbon films. It is proposed that the diamond-phase carbon in the carbon film acts as a nucleation site and enhances the diamond nucleation.
| Original language | English |
|---|---|
| Pages (from-to) | 194-198 |
| Number of pages | 5 |
| Journal | Materials Science and Engineering: B |
| Volume | 65 |
| Issue number | 3 |
| DOIs | |
| State | Published - 30 Nov 1999 |
| Externally published | Yes |